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Scholars Day: April 7, 2010

In situ heating of a Substrate during Vapor Deposition

During vapor deposition of a film, the film does not form evenly on the substrate. The film may form ‘islands’ which affects the thickness calculations, for example resistivity measurements and grain size from X-Ray diffraction, for the film. The goal of the project was to build a sample heater that would add thermal energy to the substrate. With the addition of thermal energy, the film may become more ordered allowing for better thickness measurements.

Presenter: James Enos (Undergraduate Student)
Topic: Physics
Location: Fireside Lounge - Union
Time: 1:15 pm (Session III)

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